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Thin film growth of MAX phases as functional materials

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arxiv 2201.02124 v1 pith:GDONUOPI submitted 2022-01-06 cond-mat.mtrl-sci

Thin film growth of MAX phases as functional materials

classification cond-mat.mtrl-sci
keywords growthphasesthinepitaxialapplicationsfilmfilmsfuture
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
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Layered nanolaminate ternary carbides, nitrides and carbonitrides with general formula Mn+1AXn or MAX (n = 1, 2, or 3, M is an early transition metal, A is mostly group 13 or 14 element, and X is C and/or N) has revolutionized the world of nanomaterials, due to the coexistence of both ceramic and metallic nature, giving rise to exceptional mechanical, thermal, electrical, chemical properties and wide range of applications. Although several solid-state bulk synthesis methods have been developed to produce a variety of MAX phases, however, for certain applications, the growth of MAX phases, especially in its high-quality epitaxial thin films form is of increasing interest. Here, we summarize the progress made thus far in epitaxial growth and property evaluation of MAX phase thin films grown by various deposition techniques. We also address the important future research directions to be made in terms of thin-film growth. Overall, in the future, high-quality single-phase epitaxial thin film growth and engineering of chemically diverse MAX phases may open up interesting new avenues for next-generation technology.

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