Pith. sign in

REVIEW

Simultaneous Magnetic and Charge Doping of Topological Insulators with Carbon

Not yet reviewed by Pith; the record is open.

This paper has not been read by Pith yet. Machine review is queued; the pith claim, tier, and objections will appear here once it completes.

SPECIMEN: schema-true, not a live event

T0 review · schema-true

One-sentence machine reading of the paper's core claim.

pith:XXXXXXXX · record.json · timestamp

arxiv 1303.3467 v2 pith:AMEG4XXD submitted 2013-03-14 cond-mat.mtrl-sci

Simultaneous Magnetic and Charge Doping of Topological Insulators with Carbon

classification cond-mat.mtrl-sci
keywords dopingcarbonmagneticsurfacestatestopologicalchargedirac
verification ladder T0 review T1 audit T2 compute T3 formal T4 reserved
0 comments
read the original abstract

A two-step doping process, magnetic followed by charge or vice versa, is required to produce insulating massive surface states in topological insulators for many physics and device applications. Using first-principles calculations, we demonstrate here simultaneous magnetic and hole doping achieved with a single dopant, carbon, in Bi2Se3. Carbon substitution for Se (CSe) results in an opening of a sizable surface Dirac gap (53-85 meV), while the Fermi level (EF) remains inside the bulk gap and close to the Dirac point at moderate doping concentrations. The strong localization of 2p states of CSe favors spontaneous spin polarization via a p-p interaction and formation of ordered magnetic moments mediated by the surface state. Meanwhile, holes are introduced into the system by CSe. This dual function of carbon doping suggests a simple way to realize insulating massive topological surface states.

discussion (0)

Sign in with ORCID, Apple, or X to comment. Anyone can read and Pith papers without signing in.